Titanium tetrachloride was used to synthesize titanium dioxide emulsion by the hydrolysis process. The semiconductor was deposited on raw unglazed ceramic and silicon substrate by the reactive chemical spraying process. The experimental conditions were chosen to ensure film adhesion. Obtained films were calcined at different temperatures ranging from 600^∘C to 680^∘C and characterized by X-ray diffraction, atomic force microscopy, optical measurement, contact angle measurement, and scratch test. The photocatalytic test was carried out under UV irradiation using an azo dye. The silicon substrate allowed to show the film structure. The AFM observation indicated that film roughness increased from 12nm to 32nm. Roughness growth corresponds to a large active surface and enhanced photocatalyst activity. During the photocatalyst test under UV irradiation, the sample calcined at 660^∘C shows the best result with a degradation efficiency of 140mgm−2h−1. The same sample was characterized by hydrophilic behavior and adhesion strength.

中文翻译：

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反应化学喷涂法合成的光催化二氧化钛薄膜

四氯化钛用于通过水解工艺合成二氧化钛乳液。通过反应化学喷涂工艺将半导体沉积在未上釉的陶瓷和硅衬底上。选择实验条件以确保膜粘附性。将所得薄膜在 600 ^∘ C 至 680 ^∘ C 的不同温度下煅烧，并通过 X 射线衍射、原子力显微镜、光学测量、接触角测量和划痕测试对其进行表征。使用偶氮染料在紫外线照射下进行光催化测试。硅衬底允许显示薄膜结构。AFM 观察表明薄膜粗糙度从 12纳米至 32纳米。粗糙度增长对应于较大的活性表面和增强的光催化剂活性。在紫外线照射下的光催化剂测试中，在 660 ^∘ C 下煅烧的样品显示出最好的结果，降解效率为 140毫克米-2H-1. 相同样品的特征在于亲水行为和粘合强度。