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A novel ultra-low-power CNTFET and 45 nm CMOS based ternary SRAM
Microelectronics Journal ( IF 2.2 ) Pub Date : 2021-03-20 , DOI: 10.1016/j.mejo.2021.105033
Abhay S. Vidhyadharan , Sanjay Vidhyadharan

This paper presents a CNTFET based ultra-low-power ternary SRAM design which consumes merely 66 nW of power, achieving 84–98% reduction in power consumption as compared to the other CNTFET ternary SRAM designs reported in the literature. The 6-Transistor (6T) Standard Ternary Inverter (STI) cell or the 3T-STI cell form the basic building block of the conventional SRAM cells. These conventional STI designs have an undesirable direct path between VDD and ground during certain ternary input signals, resulting in higher power consumption. In this paper, a highly power-efficient 4T-STI based Ternary SRAM design is presented, which prevents a direct path between the power supply VDD and ground in all the possible ternary logic states.

While CNTFET is preferred by many researchers around the world for low-power VLSI applications, CMOS technology is still widely used in the industry because of the availability of advanced CMOS manufacturing units. Therefore, the proposed ultra-low-power ternary SRAM design has been implemented with both 32 nm CNTFET and 45 nm CMOS devices. The performance of both the CNTFET and CMOS based ultra-low-power ternary SRAM circuits have been benchmarked with corresponding conventional SRAM circuits. The overall decrease in Power Delay Product (PDP) is 86–97% in the proposed ultra-low-power ternary 32 nm CNTFET SRAM circuit and 87–99% in the proposed 45 nm CMOS SRAM with respect to corresponding conventional ternary SRAM circuits.



中文翻译:

新型超低功耗CNTFET和基于45 nm CMOS的三态SRAM

本文介绍了一种基于CNTFET的超低功耗三态SRAM设计,其功耗仅为66 nW,与文献中报道的其他CNTFET三元SRAM设计相比,其功耗降低了84–98%。6晶体管(6T)标准三元反相器(STI)单元或3T-STI单元构成了常规SRAM单元的基本构建块。这些常规的STI设计在某些三态输入信号期间在V DD与地之间具有不希望有的直接路径,从而导致更高的功耗。本文提出了一种基于高功率效率的基于4T-STI的三态SRAM设计,该设计可防止在所有可能的三态逻辑状态下电源V DD与地之间的直接路径。

尽管CNTFET在低功耗VLSI应用中被全球许多研究人员所青睐,但由于拥有先进的CMOS制造单元,CMOS技术仍在业界广泛使用。因此,建议的超低功耗三态SRAM设计已在32 nm CNTFET和45 nm CMOS器件中实现。基于CNTFET和CMOS的超低功耗三态SRAM电路的性能已经通过相应的常规SRAM电路进行了基准测试。与相应的传统三元SRAM电路相比,拟议的超低功耗三元32nm CNTFET SRAM电路的功率延迟积(PDP)总体降低了,而拟议的45 nm CMOS SRAM的总延迟降低了87-99%。

更新日期:2021-03-27
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