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Intrasheath electron dynamics in low pressure capacitively coupled plasmas
Plasma Sources Science and Technology ( IF 3.3 ) Pub Date : 2021-03-17 , DOI: 10.1088/1361-6595/abe728
Mt Vass 1, 2 , Aranka Derzsi 2 , Julian Schulze 1, 3 , Zoltn Donk 2
Affiliation  

We present a detailed analysis of electron trajectories within the sheath regions of capacitively coupled plasmas excited by radio-frequency voltage waveforms at low pressures. Complex features inside the sheaths are identified in several physical quantities, which are sculptured by the trajectories of bouncing energetic electrons (predominantly ion induced secondary electrons) under the influence of the spatio-temporally varying electric field. Based on a systematic parameter variation the generation of the various features as a function of surface processes is explained and the trajectories of electrons of different origin are identified.



中文翻译:

低压电容耦合等离子体中的鞘内电子动力学

我们详细分析了由低压射频电压波形激发的电容耦合等离子体鞘区内的电子轨迹。鞘内的复杂特征在几个物理量中被识别出来,这些物理量是由在时空变化的电场影响下弹跳高能电子(主要是离子诱导的二次电子)的轨迹雕刻而成的。基于系统参数变化,解释了作为表面过程函数的各种特征的生成,并确定了不同来源的电子的轨迹。

更新日期:2021-03-17
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