Review of Surface Modification Technologies for Mid‐Infrared Antireflection Microstructures Fabrication,Laser & Photonics Reviews

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Review of Surface Modification Technologies for Mid‐Infrared Antireflection Microstructures Fabrication
Laser & Photonics Reviews ( IF 9.8 ) Pub Date : 2021-03-18 , DOI: 10.1002/lpor.202000202
Andrey A. Bushunov _{1,

2} , Mikhail K. Tarabrin _{1,

2,

3} , Vladimir A. Lazarev ₁

Affiliation

Mid‐infrared materials antireflection is in high demand for high‐powered or ultra‐broadband coherent light sources, where conventional antireflection coatings cannot be reliably applied. This work provides a critical review of the recent advances in microstructure fabrication technology for mid‐infrared antireflection applications. Several techniques are reviewed, including direct imprinting, wet and reactive ion etching using conventional photoresist masking, novel colloid crystal masks, and maskless etching, laser‐induced periodic structure formation, and multiple laser ablation method modifications, including femtosecond laser direct writing, direct laser interference ablation, and single pulse ablation. The advantages and drawbacks of the different approaches are discussed in detail to highlight the most promising techniques for the fabrication of antireflection microstructures capable of achieving 99% transmittance in the 2–16

μ

m range.

中文翻译：

中红外减反射微结构加工的表面改性技术综述

对于大功率或超宽带相干光源，中红外材料的防反射要求很高，而传统的防反射涂层无法可靠地应用。这项工作对中红外抗反射应用的微结构制造技术的最新进展提供了重要的评论。综述了几种技术，包括直接压印，使用常规光刻胶掩膜的湿法和反应性离子蚀刻，新型胶体晶体掩膜和无掩膜蚀刻，激光诱导的周期性结构形成以及多种激光烧蚀方法修改，包括飞秒激光直接写入，直接激光干扰消融和单脉冲消融。

μ

米范围。

更新日期：2021-05-07

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