Thin film deposition using plasma sputter is done by experimental methods, though Numerical simulation and theory are capable of generating realistic and useful results. In present exploration a theoretical model for sputtering with consequence of different plasma parameters with the help of electromagnetic lenses for planar (T_p) and cylindrical (T_c) magnetron sputteringhas been conversed. The plasma of helium gas on nickel metal objectwhich contains the velocity shear instability is considered, and T_p,T_c, under the influence of shear scale length(A_i), homogeneous DC electric field(E₀), magnetic field (B₀), density gradient (ɛ_nρ_i) have been evaluated. T_p, and T_care found to be maximum in the range of 0.815–0.91, and 0.57–0.90, respectively. Also growth rate showed direct relation to E₀ and A_i but inversely varies with B₀ and ɛ_nρ_i.

中文翻译：

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平面和圆柱磁控溅射膜沉积等离子体参数的理论分析。

使用等离子体溅射的薄膜沉积是通过实验方法完成的，尽管数值模拟和理论能够产生现实和有用的结果。在目前的探索中，已经针对用于平面（T _p）和圆柱形（T _c）磁控溅射的电磁透镜，对由于等离子体参数不同而进行溅射的理论模型进行了研究。考虑了包含速度剪切不稳定性的镍金属物体上的氦气等离子体，并在剪切标度长度（A _i），均匀直流电场（E ₀），磁场（B ₀）的影响下，T _p，T _c。），密度梯度（ɛ _Ñ ρ_我）进行了评价。 发现T _p和T _c分别在0.815–0.91和0.57–0.90的范围内最大。也增长率表明直接关系到E ₀和A_我但反比乙变化₀和ɛ _Ñ ρ_我。