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Interfacial resistive switching of Ruddlesden–Popper phase strontium titanate thin film by charge-modulated Schottky barrier
FlatChem ( IF 5.9 ) Pub Date : 2021-03-11 , DOI: 10.1016/j.flatc.2021.100239
Zhen-Xun Tang , Jun Li , Xin-Gui Tang , Qiu-Xiang Liu , Yan-Ping Jiang

Ruddlesden–Popper (RP) phase Sr2TiO4 thin film is deposited successfully on FTO/glass substrate by spin coating. X-ray diffraction (XRD) pattern shows high-intensity (00 l) (l = 2, 4, and 6) peaks. The device shows bipolar resistive switching (RS) effect. Analysis on current–voltage (I-V) characteristic shows that conduction mechanism is dominated by Schottky emission in both low resistive state (LRS) and high resistive state (HRS). A variation (~0.12 eV) in Schottky barrier height (SBH) is observed between HRS and LRS. Thus, RS at electrode-Sr2TiO4 interface is the main mechanism. In general, variation of SBH is induced by accumulation of interfacial charges. Polarization-voltage (P-V) measurement shows hysteresis loop, which indicates the accumulation of interfacial charges. Formation and migration of charged oxygen vacancies and ions is proposed to be a possible mechanism of interfacial charges accumulation. This study paves the avenue for exploring RS application based on RP phase Sr2TiO4 perovskite oxide.



中文翻译:

电荷调制的肖特基势垒对Ruddlesden-Pop相钛酸锶薄膜的界面电阻转换

通过旋涂将Ruddlesden-Popper(RP)相Sr 2 TiO 4薄膜成功沉积在FTO /玻璃基板上。X射线衍射(XRD)模式显示出高强度(00  l)(l  = 2、4和6)峰。该器件显示了双极电阻切换(RS)效果。对电流-电压(IV)特性的分析表明,在低电阻状态(LRS)和高电阻状态(HRS)两者中,导电机理均受肖特基发射的影响。在HRS和LRS之间观察到了肖特基势垒高度(SBH)的变化(〜0.12 eV)。因此,电极Sr 2 TiO 4处的RS接口是主要机制。通常,SBH的变化是由界面电荷的积累引起的。极化电压(PV)的测量显示出磁滞回线,这表明界面电荷的积累。提出带电的氧空位和离子的形成和迁移是界面电荷积累的可能机制。本研究为探索基于RP相Sr 2 TiO 4钙钛矿氧化物的RS应用铺平了道路。

更新日期:2021-03-15
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