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Experimental study of ELM-induced filament structures using the VUV imaging system on EAST
Plasma Science and Technology ( IF 1.6 ) Pub Date : 2021-03-02 , DOI: 10.1088/2058-6272/abda9d
Bang LI 1, 2 , Tingfeng MING 2 , Qing ZHUANG 2, 3 , Feifei LONG 4 , Shanlu GAO 2, 3 , Qiqi SHI 5 , Yumin WANG 2 , Xiaoju LIU 2 , Shaocheng LIU 2 , Long ZENG 2 , Xiang GAO 2, 3, 4
Affiliation  

A high-speed vacuum ultraviolet (VUV) imaging system has been developed on the Experimental Advanced Superconducting Tokamak (EAST), which selectively measures line emission with a central wavelength of 13.5 nm (CVI, n=4–2). It has been employed to study edge/pedestal plasma behavior in EAST. Edge localized mode (ELM)-induced filament structures have been captured by the VUV imaging system during the ELMy high confinement mode discharge with both high temporal and spatial resolutions. The typical features (i.e. poloidal width and pitch angle) of the observed filaments are quantitatively characterized based on the VUV imaging data, and the dependence of these features on basic plasma parameters is analyzed. It is found that the poloidal width is proportional to the heating power, and the pitch angle is inversely proportional to the edge safety factor ${q}_{95}.$ The scatterplot shows a positive trend between the poloidal width and the ELM amplitude defined by the relative change in stored energy. These results are based on the condition that the perturbation induced by ELMs is confined to a narrow layer in the plasma.



中文翻译:

使用 EAST 上的 VUV 成像系统进行 ELM 诱导细丝结构的实验研究

在实验性先进超导托卡马克 (EAST) 上开发了一种高速真空紫外 (VUV) 成像系统,该系统可以选择性地测量中心波长为 13.5 nm (CVI, n=4–2)。它已被用于研究 EAST 中的边缘/基座等离子体行为。VUV 成像系统在 ELMy 高限制模式放电期间以高时间和空间分辨率捕获了边缘局部模式 (ELM) 诱导的灯丝结构。基于 VUV 成像数据定量表征观察到的细丝的典型特征(即极向宽度和螺距角),并分析这些特征对基本等离子体参数的依赖性。发现极向宽度与加热功率成正比,俯仰角与边缘安全系数成反比${q}_{95}.$散点图显示极向宽度和由存储能量的相对变化定义的 ELM 幅度之间的正趋势。这些结果是基于 ELM 引起的扰动仅限于等离子体中的一个窄层的条件。

更新日期:2021-03-02
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