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Multiple-patterning colloidal lithography-implemented scalable manufacturing of heat-tolerant titanium nitride broadband absorbers in the visible to near-infrared
Microsystems & Nanoengineering ( IF 7.3 ) Pub Date : 2021-03-02 , DOI: 10.1038/s41378-020-00237-8
Dasol Lee 1 , Myeongcheol Go 2 , Minkyung Kim 1 , Junho Jang 2 , Chungryong Choi 2 , Jin Kon Kim 2, 3 , Junsuk Rho 1, 2, 3
Affiliation  

Broadband perfect absorbers have been intensively researched for decades because of their near-perfect absorption optical property that can be applied to diverse applications. Unfortunately, achieving large-scale and heat-tolerant absorbers has been remained challenging work because of costly and time-consuming lithography methods and thermolability of materials, respectively. Here, we demonstrate a thermally robust titanium nitride broadband absorber with >95% absorption efficiency in the visible and near-infrared region (400–900 nm). A relatively large-scale (2.5 cm × 2.5 cm) absorber device is fabricated by using a fabrication technique of multiple-patterning colloidal lithography. The optical properties of the absorber are still maintained even after heating at the temperatures >600 C. Such a large-scale, heat-tolerant, and broadband near-perfect absorber will provide further useful applications in solar thermophotovoltaics, stealth, and absorption controlling in high-temperature conditions.



中文翻译:

多图案胶体光刻实现的耐热氮化钛宽带吸收器的可扩展制造在可见光到近红外

几十年来,宽带完美吸收体因其近乎完美的吸收光学特性而得到深入研究,可应用于多种应用。不幸的是,由于昂贵且耗时的光刻方法和材料的热稳定性,实现大规模和耐热吸收器仍然是一项具有挑战性的工作。在这里,我们展示了一种耐热性强的氮化钛宽带吸收剂,在可见光和近红外区域(400-900 nm)具有 >95% 的吸收效率。通过使用多图案胶体光刻的制造技术制造了相对大尺寸(2.5 cm × 2.5 cm)的吸收器装置。即使在 >600 的温度下加热后,吸收体的光学特性仍然保持不变 C. 这种大规模、耐热、宽带近乎完美的吸收体将在太阳能热光伏、隐身和高温条件下的吸收控制方面提供进一步的有用应用。

更新日期:2021-03-02
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