We investigate the depth of field (DoF) enhancing capacity of binary annular phase masks embedded in panchromatic imaging systems. We first demonstrate with numerical simulations and real-world imaging experiments that phase masks optimized for monochromatic illumination are somewhat robust to their use under wide spectrum illumination: they provide images that are slightly less sharp but less affected by deconvolution artifacts due to spectral averaging. Then, we show that masks specifically optimized for wide spectrum illumination perform better under this type of illumination than monochromatically optimized phase masks under monochromatic illumination, especially when the targeted DoF range is large. This interesting effect comes from the fact that deconvolution artifacts are significantly reduced by wide spectrum illumination. These results show that it is useful to take into account the illumination spectrum together with the scene characteristics and the targeted DoF range for effective co-design of DoF enhancing imaging systems.

中文翻译：

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共同设计的用于增强全色相机景深的二进制相位掩模的理论和实验分析

我们研究了嵌入全色成像系统中的二元环形相位掩模的景深（DoF）增强能力。我们首先通过数值模拟和现实世界的成像实验证明，针对单色照明进行优化的相位掩模对于在宽光谱照明下的使用具有一定的鲁棒性：它们提供的图像清晰度较差，但由于光谱平均而受到去卷积伪像的影响较小。然后，我们表明，针对宽带照明特别优化的掩模在单色照明下比单色优化的相位掩模在单色照明下表现更好，尤其是在目标自由度范围较大时。这种有趣的效果来自以下事实：通过宽光谱照明可以大大减少反卷积伪像。