Abstract

Low-pressure inductively coupled plasma of gaseous CF₃Br has been studied by Langmuir probe and optical emission spectroscopy (actinometry) techniques. The electron temperature, electron and positive ion concentrations, and concentrations of fluorine- and bromine-containing radicals are determined. An explanation of the previously reported significant degradation of ultralow-k dielectrics during etching in this plasma is proposed.

中文翻译：

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朗缪尔探针和光发射光谱技术研究低压电感耦合CF 3 Br等离子体

摘要

气态CF ₃ Br的低压感应耦合等离子体已经通过Langmuir探针和光发射光谱法（光度法）技术进行了研究。确定电子温度，电子和正离子浓度以及含氟和溴的自由基的浓度。提出了对先前报道的在该等离子体中的蚀刻期间超低k电介质的显着降解的解释。