Optical Third-Harmonic Generation in Hexagonal Boron Nitride Thin Films,ACS Photonics

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Optical Third-Harmonic Generation in Hexagonal Boron Nitride Thin Films
ACS Photonics ( IF 6.5 ) Pub Date : 2021-02-24 , DOI: 10.1021/acsphotonics.0c01759
Anna A. Popkova ₁ , Ilya M. Antropov ₁ , Johannes E. Fröch ₂ , Sejeong Kim ₃ , Igor Aharonovich _{2,

4} , Vladimir O. Bessonov _{1,

5} , Alexander S. Solntsev ₂ , Andrey A. Fedyanin ₁

Affiliation

Hexagonal boron nitride (hBN) is a layered material that exhibits remarkable optical features in the UV, visible, and IR ranges, attractive for applications in modern photonics. Being transparent in a wide spectral range, hBN is now considered an important building block for novel integrated photonic platforms, thus requiring the study of its optical properties. In this work, we report on the measurements of hBN optical cubic nonlinearity χ⁽³⁾ equal to 8.4 × 10^–21 m²/V² by observing the third-harmonic generation for 1080 nm pump wavelength from mechanically exfoliated hBN flakes with thicknesses varying from 5 to 170 nm. The third-order susceptibility of hBN is close to that of Si₃N₄ highlighting the potential of hBN for nonlinear applications.

中文翻译：

六方氮化硼薄膜中的光学三次谐波产生。

六方氮化硼（hBN）是一种层状材料，在UV，可见光和IR范围内显示出显着的光学特性，对现代光子学中的应用具有吸引力。hBN在很宽的光谱范围内都是透明的，现在被认为是新型集成光子平台的重要组成部分，因此需要对其光学性质进行研究。在这项工作中，我们通过观察厚度变化不定的机械剥离hBN片产生的1080 nm泵浦波长的三次谐波，报告了hBN光学立方非线性χ ^（3）等于8.4×10 ^–21 m ² / V ²的测量结果5至170 nm hBN的三阶磁化率接近Si ₃ N ₄的三阶磁化率强调了hBN在非线性应用中的潜力。

更新日期：2021-03-17

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