The mechanism for the deposition of zinc to form porous thin films is not clearly understood. In this study, a modified direct current (DC) sputtering system was used to deposit polycrystalline porous zinc thin films on an amorphous glass substrate to elucidate the mechanism. Subsequently, the properties of the thin films, such as its film thickness, the average particle size, and its porosity, were investigated under different experimental parameters, including pressure, DC discharge power, and the gas ratio between Ar and He. The plasma properties were also studied using a Langmuir probe. An increase in deposition pressure and DC discharge power was found to increase the deposition thickness and the particle size in the thin films whereas an increase in the He content increased the thickness and decreased the particle size. The investigation of the growth mechanism revealed that the zinc particles were oriented in different planes at early and later stages of deposition. Moreover, the properties of the thin films were observed to be affected by the energy loss of the zinc atoms and the bonding force between the substrate and the zinc particles. This understanding of the mechanism of thin-film formation will help to guide the optimization of experimental parameters in the fabrication of high-quality thin films.

锌沉积形成多孔薄膜的机理尚不清楚。在这项研究中，使用改进的直流（DC）溅射系统在非晶玻璃基板上沉积多晶多孔锌薄膜，以阐明其机理。随后，在不同的实验参数下，包括压力，直流放电功率以及Ar和He之间的气体比率，研究了薄膜的特性，例如薄膜厚度，平均粒径和孔隙率。还使用Langmuir探针研究了等离子体性能。发现沉积压力和DC放电功率的增加增加了薄膜中的沉积厚度和粒径，而He含量的增加增加了厚度并减小了粒径。对生长机理的研究表明，锌颗粒在沉积的早期和后期都在不同的平面上取向。此外，观察到薄膜的性能受锌原子的能量损失以及基材与锌颗粒之间的结合力的影响。对薄膜形成机理的这种理解将有助于指导高质量薄膜制造中实验参数的优化。