Abstract

Electrodynamic characteristics of a low pressure (electron collision frequency much lower than the field frequency) capacitive high frequency (HF) discharge maintained by electromagnetic field with a frequency between 10 and 1000 MHz are studied analytically and numerically. The discharge is assumed to fill completely a cylindrical metallic discharge chamber that contains a large area active electrode and a substrate holder connected to HF generators. The discharge is sustained by surface waves propagating along the plasma–space-charge sheath–metal interface. General analytical expressions governing impedance of the discharge are derived treating it as a two-point network. It is demonstrated that excitation of higher-order field modes substantially modifies position of current and voltage resonances related to propagation of surface waves along the three-layer structure as functions of electron density. Regimes of field excitation by symmetric and antisymmetric fields are analyzed within the framework of the matrix sheath model. Contribution of sheath formed near the sidewall of the vacuum chamber to the impedance must be taken into account in the case of excitation by an antisymmetric field. Obtained results qualitatively agree with numerical calculation of the impedance and field space distribution in the discharge carried out by using the COMSOL Multiphysics^® software package.

中文翻译：

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电容性高频放电中的电磁场激励特性。二。在对称和不对称激励下对称排放完全充满真空室

摘要

通过分析和数值研究了由电磁场维持的低压（电子碰撞频率远低于场频）的电容性高频放电的电动力特性。假定放电完全充满了圆柱形金属放电室，该放电室包含大面积的有源电极和连接到HF发生器的基板支架。放电由沿等离子体-空间电荷鞘-金属界面传播的表面波维持。导出了控制放电阻抗的一般分析表达式，将其视为两点网络。已经证明，高阶场模的激发实质上改变了与表面波沿三层结构的传播有关的电流和电压共振的位置，这是电子密度的函数。在矩阵鞘模型的框架内分析了对称场和反对称场的场激励方式。在由非对称场激励的情况下，必须考虑在真空室侧壁附近形成的护套对阻抗的贡献。获得的结果在质量上与使用COMSOL Multiphysics对放电中的阻抗和场空间分布进行数值计算吻合 在矩阵鞘模型的框架内分析了对称场和反对称场的场激励方式。在由非对称场激励的情况下，必须考虑在真空室侧壁附近形成的护套对阻抗的贡献。获得的结果在质量上与使用COMSOL Multiphysics对放电中的阻抗和场空间分布进行数值计算吻合 在矩阵鞘模型的框架内分析了对称场和反对称场的场激励方式。在由非对称场激励的情况下，必须考虑在真空室侧壁附近形成的护套对阻抗的贡献。获得的结果在质量上与使用COMSOL Multiphysics对放电中的阻抗和场空间分布进行数值计算吻合^®软件包。