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BAlN for III-nitride UV light-emitting diodes: undoped electron blocking layer
Journal of Physics D: Applied Physics ( IF 3.4 ) Pub Date : 2021-02-14 , DOI: 10.1088/1361-6463/abdefc
Wen Gu 1, 2, 3 , Yi Lu 2 , Rongyu Lin 2 , Wenzhe Guo 2 , Zihui Zhang 4 , Jae-Hyun Ryou 5 , Jianchang Yan 1 , Junxi Wang 1 , Jinmin Li 1 , Xiaohang Li 2
Affiliation  

The undoped BAlN electron-blocking layer (EBL) is investigated to replace the conventional AlGaN EBL in light-emitting diodes (LEDs). Numerical studies of the impact of variously doped EBLs on the output characteristics of LEDs demonstrate that the LED performance shows heavy dependence on the p-doping level in the case of the AlGaN EBL, while it shows less dependence on the p-doping level for the BAlN EBL. As a result, we propose an undoped BAlN EBL for LEDs to avoid the p-doping issues, which a major technical challenge in the AlGaN EBL. Without doping, the proposed BAlN EBL structure still possesses a superior capacity in blocking electrons and improving hole injection compared with the AlGaN EBL having high doping. Compared with the Al0.3Ga0.7N EBL with a doping concentration of 1 1020 cm−3, the undoped BAlN EBL LED still shows lower droop (only 5%), compatible internal quantum efficiency (2% enhancement), and optical output power (6% enhancement). This study provides a feasible route to addressing electron leakage and insufficient hole injection issues when designing ultraviolet LED structures.



中文翻译:

III氮化物紫外发光二极管的BAlN:未掺杂的电子阻挡层

研究了未掺杂的BAlN电子阻挡层(EBL),以取代发光二极管(LED)中的常规AlGaN EBL。对各种掺杂的EBL对LED的输出特性的影响的数值研究表明,在AlGaN EBL的情况下,LED性能表现出对p掺杂水平的严重依赖性,而对于AlGaN EBL而言,对p掺杂水平的依赖性较小。巴恩EBL。因此,我们提出了一种用于LED的未掺杂BAlN EBL,以避免p掺杂问题,这是AlGaN EBL中的一项主要技术挑战。在没有掺杂的情况下,与具有高掺杂的AlGaN EBL相比,提出的BAlN EBL结构仍具有出色的阻挡电子和改善空穴注入的能力。与Al 0.3 Ga 0.7相比N EBL的掺杂浓度为1 10 20 cm -3,未掺杂的BAlN EBL LED仍然显示出较低的下垂(仅5%),兼容的内部量子效率(增强2%)和光输出功率(增强6%)。这项研究为设计紫外线LED结构时解决电子泄漏和空穴注入不足的问题提供了一条可行的途径。

更新日期:2021-02-14
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