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Design, fabrication, test, and analysis of an out-of-plane plasmonic optical metasurface
Journal of Nanophotonics ( IF 1.5 ) Pub Date : 2021-02-01 , DOI: 10.1117/1.jnp.15.016005
Carlos D. Diaz 1 , David B. Burckel 2 , Bryan Adomanis 1 , Augustine M. Urbas 3 , Michael A. Marciniak 1
Affiliation  

Plasmonic metasurfaces with in-plane phase elements have a limit in transmission because they only affect the electric field of incident EM radiation. Recently, a set of out-of-plane plasmonic phase elements was designed using a genetic algorithm to work in the infrared as a Huygens metasurface with significantly improved transmission efficiency. A beam-steering metasurface (i.e., blazed transmissive diffraction grating) was fabricated from this design using membrane projection lithography (MPL) and characterized for its bidirectional transmittance distribution function as a function of scatter angle for normally incident light, and linear incident and transmitted polarizations. Measurements were compared with the designed behavior as predicted by finite element method (FEM) simulations that generated near fields for each phase element and propagated them to the far field as a metasurface using a Stratton–Chu formulation, but measurements showed strong zero-order diffraction not present in the simulation along with the designed +1-diffraction order. We analyze this disagreement between measured and ideal results. Further FEM modeling included the introduction of defects into the phase elements consistent with defects expected from the fabrication process and identified lateral displacement of the plasmonic decoration in the MPL structure as a potential cause for the reduced performance of the fabricated device.

中文翻译:

平面外等离激元光学超表面的设计,制造,测试和分析

具有平面内相位元素的等离子超表面的传输受到限制,因为它们仅影响入射EM辐射的电场。最近,使用遗传算法设计了一组平面外等离振子相位元素,使其在红外下作为惠更斯超表面工作,并显着提高了传输效率。通过这种设计,使用膜投影光刻(MPL)来制造光束转向超表面(即,闪耀的透射衍射光栅),并且其双向透射率分布函数是法向入射光以及线性入射和透射偏振的散射角的函数。 。将测量结果与有限元方法(FEM)模拟所预测的设计行为进行比较,该有限元方法使用Stratton-Chu公式为每个相位元素生成近场并将其作为超表面传播到远场,但测量结果显示出强零级衍射仿真中不存在设计的+1衍射级。我们分析了测量结果与理想结果之间的分歧。进一步的FEM建模包括将缺陷引入与制造过程中预期的缺陷一致的相元素中,并确定MPL结构中等离子装饰的横向位移,这是造成所制造器件性能下降的潜在原因。但测量结果显示,在模拟中不存在强零级衍射以及设计的+1级衍射。我们分析了测量结果与理想结果之间的分歧。进一步的FEM建模包括将缺陷引入与制造过程中预期的缺陷一致的相元素中,并确定MPL结构中等离子装饰的横向位移,这是造成所制造器件性能下降的潜在原因。但测量结果显示,在模拟中不存在强零级衍射以及设计的+1级衍射。我们分析了测量结果与理想结果之间的分歧。进一步的FEM建模包括将缺陷引入与制造过程中预期的缺陷一致的相元素中,并确定MPL结构中等离子装饰的横向位移,这是造成所制造器件性能下降的潜在原因。
更新日期:2021-02-15
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