In this study, we propose a new type of nanolithography procedure to fabricate orderly patterned metallic nanostructures using the electrohydrodynamic method and the reactive ion etching process. The electrohydrodynamic process parameters were tuned so as to create patterning with precision, and fibers in nanoscale on silver-coated substrates. We also studied reactive ion etching with different durations on the well-patterned samples. The experiments show that applying a voltage of 400 V resulted in straight patterned fibers with a diameter of 208.7 ± 30.3 nm. The statistical analysis on scanning electron microscope (SEM) images showed a significant difference in the diameter of the fibers fabricated at 400 V compared to those at 500 V and 600 V. We also confirm that the etching process has no affect on the fiber diameter. Moreover, electron dispersive X-Ray spectrometer (EDX) results suggest that an etching duration of 7 min is sufficient to remove the silver coating that is not covered with the fibers, and protect the silver nanostructures underneath the fibers. Utilizing a low-cost nanolithography procedure, we obtain the orderly patterned silver nanostructures for possible integration into miniaturized devices.

在这项研究中，我们提出了一种新型的纳米光刻工艺，以利用电流体动力学方法和反应离子刻蚀工艺来制造有序的图案化金属纳米结构。调节电流体动力学工艺参数，以便精确地形成图案，并在涂银的基材上形成纳米级的纤维。我们还研究了图案良好的样品上不同持续时间的反应性离子蚀刻。实验表明，施加400 V电压会产生直径208.7±30.3 nm的直纹纤维。扫描电子显微镜（SEM）图像的统计分析表明，与在500 V和600 V时相比，在400 V时制造的纤维的直径存在显着差异。我们还确认了蚀刻工艺对纤维直径没有影响。而且，电子色散X射线光谱仪（EDX）的结果表明，7分钟的蚀刻时间足以去除未被纤维覆盖的银涂层，并保护纤维下方的银纳米结构。使用低成本的纳米光刻程序，我们获得了有序的图案化的银纳米结构，以便可能集成到小型设备中。