Abstract

Article shows experimental results of thin ZnO films synthesis with required structure and thickness produced by different atomic layer deposition methods (normal temperature, thermal and photo-assisted deposition). The influence of the synthesis temperature and UV-irradiation on the characteristics of ZnO films was analyzed. Both amorphous and polycrystalline films were synthesized by changing the deposition parameters. Film optical properties were examined in UV, visible and IR range. The bandgap was determined using absorption spectra. Morphological parameters of the films were valued using the atomic force microscopy. Suppositions on film growth mechanisms were made, preliminary results of friction wear tests are quoted.

中文翻译：

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ALD法合成氧化锌薄膜的技术

摘要

文章显示了通过不同的原子层沉积方法（常温，热和光辅助沉积）制备具有所需结构和厚度的ZnO薄膜的实验结果。分析了合成温度和紫外线辐射对ZnO薄膜特性的影响。通过改变沉积参数合成非晶和多晶膜。在紫外线，可见光和红外线范围内检查了薄膜的光学性能。使用吸收光谱确定带隙。使用原子力显微镜对膜的形态参数进行评估。提出了膜生长机理的假设，并引用了摩擦磨损试验的初步结果。