Recently, ZnO film paid much attention, for many application such as transparent conductive film and photo devise. In order to use as transparent conductive film, ZnO films need be obtained at high growth rate. Fabrication of oxide films by electrochemical deposition from aqueous solutions is possible to fabrication at low temperature. And thickness and electric characteristics of ZnO film can be easily controlled by electrochemical parameters. Mentioned above, this electrochemical deposition is optimal technique for manufacturing technique for transparent conductive film. We will support that the adjustment of the alkaline electrolyte for ZnO film gives the rapidly growth of ZnO films at low temperature. In this investigation, the influence of the electrical and optical properties for ZnO films with the deposition temperature will be investigated. For optical and electrical results, the growth rate and the carrier concentration of ZnO films increase with an increase in the deposition temperature. And the optical bandgap energy is constant at about 3.37 eV. Thus, the electric property and deposition rate of ZnO film will be controlled by the deposition temperature.

中文翻译：

---

水溶液中电化学沉积法快速制备ZnO薄膜

近年来，ZnO膜在透明导电膜，照相装置等许多应用领域中引起了人们的广泛关注。为了用作透明导电膜，需要以高生长速率获得ZnO膜。通过从水溶液中电化学沉积来制造氧化膜可以在低温下进行。ZnO薄膜的厚度和电学特性可以通过电化学参数容易地控制。如上所述，这种电化学沉积是用于透明导电膜的制造技术的最佳技术。我们将支持调整用于ZnO膜的碱性电解质，可以使ZnO膜在低温下快速生长。在这项研究中，将研究ZnO薄膜的电学和光学特性对沉积温度的影响。对于光学和电学结果，ZnO薄膜的生长速率和载流子浓度随沉积温度的升高而增加。光学带隙能量恒定在约3.37 eV。因此，ZnO膜的电性能和沉积速率将通过沉积温度来控制。