Hard silicon carbonitride thin‐film coatings by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 2: Physical, optical, and mechanical properties of deposited films,Plasma Processes and Polymers

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Hard silicon carbonitride thin‐film coatings by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 2: Physical, optical, and mechanical properties of deposited films
Plasma Processes and Polymers ( IF 2.9 ) Pub Date : 2021-02-03 , DOI: 10.1002/ppap.202000241
Aleksander M. Wrobel ₁ , Pawel Uznanski ₁

Affiliation

Physical, optical, and mechanical properties of silicon carbonitride (a‐SiCN) films produced by remote hydrogen plasma chemical vapor deposition (RP‐CVD) using aminosilane and disilazane precursors are examined in relation to their chemical structure. The films deposited at different temperatures (30–400°C) were characterized in terms of their density, refractive index, optical bandgap, photoluminescence, adhesion to a substrate, hardness, elastic modulus resistance to wear (predicted from the “plasticity index” values), and friction coefficient. Reasonable structural dependencies of film properties were determined using the relative integrated intensities of the infrared absorption bands from the Si−N and Si−C bonds, and the X‐ray photoelectron spectroscopy Si2p band from the Si−C bonds (controlled by substrate temperature) evaluated in the first part of this study. In view of their good mechanical properties, a‐SiCN films seem to be useful coatings for improving surface mechanics of engineering materials for advanced technology.

中文翻译：

使用氨基硅烷和硅氮烷前体，通过远程氢等离子体化学气相沉积，形成硬质碳氮化硅薄膜涂层。2：沉积膜的物理，光学和机械性能

通过使用氨基硅烷和二硅氮烷前体的远程氢等离子体化学气相沉积（RP-CVD）生产的碳氮化硅（a-SiCN）膜的物理，光学和机械性能与它们的化学结构有关。在不同温度（30–400°C）下沉积的薄膜的特征在于密度，折射率，光学带隙，光致发光，对基材的粘附性，硬度，弹性模量耐磨损性（由“可塑性指数”值预测））和摩擦系数。使用来自Si-N和Si-C键的红外吸收带的相对积分强度确定了薄膜性能的合理结构依赖性，在本研究的第一部分中评估了由Si-C键（受衬底温度控制）的X射线光电子能谱Si2p谱带。鉴于其良好的机械性能，a-SiCN膜似乎是用于改进先进技术的工程材料的表面力学的有用涂层。

更新日期：2021-04-06

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