Molybdenum trioxide (MoO₃) thin films are made by Pulsed Laser Deposition (PLD) technique onto cleaned glass substrates at an oxygen partial pressure (PO₂) of 100 m Torr by varying substrate temperature (T_s). The present study describes the variation in the growth of films and photochromic properties with respect to substrate temperature. XRD studies confirm unique α - orthorhombic layered structure for grown films and the intensity of prominent peaks increases with substrate temperature. SEM images discloses that the film surface constitutes uniformly spherical grains at lower substrate temperature (T_s = 100 ℃) and turns to needle like structure as substrate temperature reaches to 200 and 300 ℃. The films deposited at 400 ℃ gives nano-crystalline structure which shows stable and high photochromic efficiency. The studies also reveal that the presence of impurities or ions on the surface of the film and effects on the photochromic performance.

中文翻译：

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PLD生长的MoO3薄膜的光致变色性能

通过改变衬底温度（T _s），在100 m Torr的氧分压（PO ₂）下，通过脉冲激光沉积（PLD）技术将三氧化钼（MoO ₃）薄膜制作到清洁的玻璃衬底上。本研究描述了相对于衬底温度的薄膜生长和光致变色特性的变化。XRD研究证实，生长的薄膜具有独特的α-斜方分层结构，并且突出峰的强度随基材温度的升高而增加。SEM图像表明，在较低的基板温度（T _s）下，膜表面构成均匀的球形晶粒= 100℃），并在基板温度达到200和300℃时变成针状结构。在400℃下沉积的薄膜具有纳米晶体结构，显示出稳定且高的光致变色效率。研究还表明，膜表面上存在杂质或离子，并影响光致变色性能。