Lifetime assessment of hollow cathode (HC) sources is an experimentally demanding process, due to the large amount of hours space qualification requires. In this Paper, we present a one-dimensional orifice model coupled to a global-averaged insert model, developed for lifetime prediction of a HC neutralizer in terms of orifice erosion; a modified sputtering yield curve is derived, similar to a previous literature work, and the role of anomalous resistivity is discussed in view of the erosion profile. Variations on the active length parameter, required for the insert modeling, are seen to affect the orifice plasma profiles and the erosion to a lesser degree, and the time evolution of the orifice channel confirms the expected asymptotic decrease of the erosion rate.

由于空间鉴定需要大量的时间，因此空心阴极（HC）离子源的寿命评估是一项实验要求很高的过程。在本文中，我们提出了与整体平均插入模型耦合的一维孔模型，该模型是为预测HC中和器在孔腐蚀方面的寿命而开发的；类似于先前的文献工作，得出了修改后的溅射屈服曲线，并根据腐蚀曲线讨论了异常电阻率的作用。插入模型要求的有效长度参数的变化会在较小程度上影响孔口血浆分布和腐蚀，并且孔口通道的时间演变确定了腐蚀速率的预期渐近降低。