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Electron interference experiment with optically zero propagation distance for V-shaped double slit
Applied Physics Express ( IF 2.3 ) Pub Date : 2021-01-23 , DOI: 10.35848/1882-0786/abd91e
Ken Harada 1 , Tetsuya Akashi 2 , Yoshio Takahashi 2 , Tetsuji Kodama 3 , Keiko Shimada 1 , Yoshimasa A. Ono 1 , Shigeo Mori 4
Affiliation  

In an electron double-slit experiment, an optically zero propagation distance condition (infocus imaging condition), in which the double-slit position was imaged just on the detector plane (image plane), was realized in a 1.2MV field-emission transmission electron microscope. Interference fringes composed of dot images were controlled by using two electron biprisms. Using a V-shaped double slit, we observed the interference features under the pre-interference condition, interference condition and post-interference condition of electron waves. We conclude that it is possible to observe the interference fringes only when the path information of the individual electrons is not available.



中文翻译:

V型双缝光学零传播距离电子干涉实验

在电子双缝实验中,在 1.2MV 场发射透射电子中实现了光学零传播距离条件(聚焦成像条件),其中双缝位置恰好在检测器平面(像平面)上成像显微镜。通过使用两个电子双棱镜来控制由点图像组成的干涉条纹。利用V型双缝,我们观察了电子波在干涉前、干涉条件和干涉后条件下的干涉特征。我们得出结论,只有当单个电子的路径信息不可用时,才有可能观察到干涉条纹。

更新日期:2021-01-23
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