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On the diffusion current in a MOSFET operated down to deep cryogenic temperatures
Solid-State Electronics ( IF 1.4 ) Pub Date : 2021-01-23 , DOI: 10.1016/j.sse.2020.107949
G. Ghibaudo , M. Aouad , M. Casse , T. Poiroux , C. Theodorou

A detailed and didactic analysis of the diffusivity in a 2D inversion layer is carried out, providing its dependence on carrier density and temperature. Then, a comprehensive study of the diffusion and drift current components in a MOSFET is proposed. Their dependence with gate and drain voltages is investigated down to deep cryogenic temperature, revealing that at T = 4 K the diffusion current is nearly constant in strong inversion whatever the mobility law. Finally, based on our diffusivity analysis, a new formulation of the diffusion noise valid from weak to strong inversion down to very low temperature has been developed.



中文翻译:

在低至深低温下工作的MOSFET中的扩散电流

对二维反型层中的扩散率进行了详细的教学分析,确定其对载流子密度和温度的依赖性。然后,提出了对MOSFET中扩散和漂移电流分量的综合研究。研究了它们在深低温下对栅极和漏极电压的依赖性,发现无论迁移率定律如何,在T = 4 K时,扩散电流在强反转中几乎恒定。最后,根据我们的扩散率分析,开发了一种新的扩散噪声公式,可以有效地实现从弱到强反演到非常低的温度。

更新日期:2021-01-24
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