Optimizing the locations and sizes of droplets is the key to reducing defects and increasing throughput of ultraviolet nanoimprint lithography. In practice the templates are composed of regions with different structures. The interface between structures will generate complicated fluid flow behavior that will slow the filling time. Here, we explore several strategies through simulations to distribute resist material according to a nonuniform pattern to reduce filling time and ultimately increase throughput. In order to mimic the complexity of a template, the interface between different pairs of template structures is considered and the spreading and merging of droplets are simulated. From these simulations, it is found that the volume and arrangement of droplets underneath strongly affect the imprint time. By distributing the correct amount of resist underneath the template, one can remove the unnecessary fluid transferring step in droplet spreading and reduce the total filling time. Furthermore, by optimally placing the resist droplets, one can delay merging events and accelerate the spreading speed. Finally, the advantage of hexagonal arrangements is explored.

中文翻译：

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使用具有多种结构的模板最大限度地缩短紫外纳米压印光刻的填充时间

优化液滴的位置和尺寸是减少缺陷和提高紫外纳米压印光刻产量的关键。在实践中，模板由具有不同结构的区域组成。结构之间的界面会产生复杂的流体流动行为，从而减慢填充时间。在这里，我们通过模拟探索了几种策略，以根据不均匀的图案分布抗蚀剂材料，以减少填充时间并最终提高产量。为了模拟模板的复杂性，考虑了不同模板结构对之间的界面，并模拟了液滴的扩散和合并。从这些模拟中，发现下方液滴的体积和排列强烈影响压印时间。通过在模板下方分配正确数量的抗蚀剂，可以消除液滴扩散过程中不必要的流体转移步骤，并减少总填充时间。此外，通过优化放置抗蚀剂液滴，可以延迟合并事件并加快扩散速度。最后，探讨了六边形排列的优势。