Thin films in the aluminosilicate (AlSiO) system containing up to 31 at. % Al and 23 at. % Si were prepared by reactive RF magnetron co-sputtering in order to investigate the dependence of film formation and optical properties on substrate temperature and Si and Al contents. The obtained films were amorphous with smooth microstructure. The growth rate at different substrate temperatures ranged from 1.2 to 3.3 nm/min and increase with increasing the Si target power. The roughness decreases and thickness increases with increasing Si content. The thickness of the films grown at a deposition temperature of 100 °C is found to be higher than the films deposited at 300 and 500 °C. The AlSiO-coated glasses have a higher transmission in the visible region than the uncoated glass. The spectroscopic ellipsometry analysis reveals that the refractive index value decreased with decreasing the Al content, having extinction coefficient values of zero in the measured spectral region and band gap values ≥ 3.4 eV. The obtained thin films have over 90% transmittance in the visible range and no systematic variation of transmittance was observed with substrate temperature. The results suggest that glass substrate coated with AlSiO thin films have improved optical properties.

铝硅酸盐（AlSiO）系统中的薄膜最多包含31 at。％Al和23 at。为了研究成膜和光学性能对衬底温度以及Si和Al含量的依赖性，通过反应性RF磁控管共溅射制备％Si。所得膜为无定形且具有光滑的微结构。在不同衬底温度下的生长速率在1.2至3.3 nm / min的范围内，并随着Si目标功率的增加而增加。随着Si含量的增加，粗糙度降低，厚度增加。发现在100℃的沉积温度下生长的膜的厚度大于在300℃和500℃下沉积的膜的厚度。涂覆有AlSiO的玻璃在可见光区域的透射率高于未涂覆的玻璃。椭圆偏振光谱分析表明，折射率值随Al含量的降低而降低，在测得的光谱范围内消光系数值为零，带隙值≥3.4 eV。所获得的薄膜在可见光范围内具有超过90％的透射率，并且没有观察到透射率随基板温度的系统变化。结果表明，涂​​覆有AlSiO薄膜的玻璃基板具有改善的光学性能。