Effects of NaI as an additive on electrodeposition of Al coatings in AlCl₃-NaCl-KCl (80-10-10 wt-%) molten salts electrolyte at 150 °C were investigated by means of cyclic voltammetry, chronopotentiometry, scanning electron microscopy and X-ray diffraction (XRD). Results reveal that addition of NaI in the electrolyte intensifies cathodic polarization, inhibits growth of Al deposits and increases number density of charged particles. The electrodeposition of Al coatings in the AlCl₃-NaCl-KCl molten salts electrolyte proceeds via three-dimensional instantaneous nucleation which however exhibits irrelevance with NaI. Galvanostatic deposition results indicate that NaI could facilitate the formation of uniform Al deposits. A compact coating consisting of Al deposits with an average particle size of 3 µm was obtained at a current density of 50 mA·cm⁻² in AlCl₃-NaCl-KCl molten salts electrolyte with 10 wt-% NaI. XRD analysis confirmed that NaI could contribute to the formation of Al coating with a preferred crystallographic orientation along (220) plane.

通过循环伏安法，计时电位法，扫描电子显微镜和X射线研究了NaI作为添加剂对150°C的AlCl ₃ -NaCl-KCl（80-10-10 wt％）熔融盐电解质中Al涂层电沉积的影响射线衍射（XRD）。结果表明，在电解液中添加NaI会增强阴极极化，抑制Al沉积物的生长并增加带电粒子的数量密度。在AlCl _3中电沉积Al涂层-NaCl-KCl熔融盐电解质通过三维瞬时成核作用进行，但与NaI无关。恒电流沉积结果表明，NaI可以促进均匀的Al沉积物的形成。在具有10wt％NaI的AlCl ₃ -NaCl-KCl熔融盐电解质中，以50mA·cm ^-2的电流密度，获得由平均粒径为3μm的Al沉积物组成的致密涂层。XRD分析证实NaI可以有助于形成具有沿（220）面的优选晶体学取向的Al涂层。