当前位置: X-MOL 学术Prog. Cryst. Growth Ch. Mater. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Disk-driven flows and interface shape in vertical Bridgman growth with a baffle
Progress in Crystal Growth and Characterization of Materials ( IF 4.5 ) Pub Date : 2021-01-20 , DOI: 10.1016/j.pcrysgrow.2020.100512
A.G. Ostrogorsky

In vertical Bridgman (VB) systems, the shape of the S-L interface greatly influences the yield and perfection of single crystal, because of the continuous contact with the crucible. The melt flows and the shape of the S-L interface are difficult to modify and control.

Baffles are flow-directing or obstructing devices. In VB melts, the baffles are disk shaped, and positioned horizontally above the solid-liquid (S-L) interface. The role of the baffle is to: i) minimize the thermally-driven convection ii) control/reduce the axial heat transfer to the S-L interface and iii) generate the disk-driven flows. Furthermore, the baffle acts as a partition, splitting the melt into: the growth melt below the baffle and the feeding melt above the baffle.

Forced convection is a practical alternative to the less feasible and reliable option of completely eliminating thermally-driven unsteady flows. In the Czochralski (CZ) process, the flow driven by crystal rotation is a key control parameter which the VB process lacks. Baffle rotation brings the CZ-like flow into the VB process. The disk-driven flows are optimal for various scientific and engineering applications because the laminar boundary layers at the disk surface are steady and have uniform thickness.

In VB melts, the thermal conductivity of the baffle and its rotation rate dominate the interface shape and thus the yield and perfection of single crystals. Under the rotating baffle, the effects of natural convection can be made negligible in production size melts.



中文翻译:

垂直驱动布里奇曼增​​长中的磁盘驱动流和界面形状

在垂直Bridgman(VB)系统中,由于与坩埚的连续接触,SL界面的形状极大地影响了单晶的产量和完美度。熔体流动和SL界面的形状很难修改和控制。

挡板是导流或阻塞装置。在VB熔体中,挡板为盘形,并水平放置在固液(SL)界面上方。挡板的作用是:i)最小化热驱动对流; ii)控制/减少到SL接口的轴向热传递;以及iii)产生磁盘驱动的气流。此外,挡板用作分隔物,将熔体分成:挡板下方的生长熔体和挡板上方的进料熔体

强制对流是完全消除热驱动不稳定流的较不可行和不可靠的选择的一种实用替代方案。在切克劳斯基(CZ)工艺中,由晶体旋转驱动的流动是VB工艺缺少的关键控制参数。挡板旋转将类CZ的流带入VB流程。磁盘驱动的流是各种科学和工程应用的最佳选择,因为磁盘表面的层状边界层稳定且厚度均匀。

在VB熔体中,折流板的热导率及其旋转速度决定着界面形状,从而决定了单晶的产量和完美度。在旋转挡板下,自然对流的影响在生产尺寸的熔体中可以忽略不计。

更新日期:2021-01-20
down
wechat
bug