We investigated the combined effect of flux pinning by three-directional columnar defects (CDs) in a wide field-angular range of YBa₂Cu₃O_y thin films, where CDs parallel to the c-axis and CDs crossing at ±θ_i (θ_i = 45°, 60° and 80°) relative to the c-axis were installed by 200 MeV Xe-ion irradiations. The three-directional CDs with θ_i ≤ ±60° form a field angular curve of critical current density J_c with a broad peak centered at magnetic field (B) parallel to the c-axis, whereas the J_c shows no peaks around the crossing angles of ±θ_i. When the crossing angle is expanded to θ_i= ±80°, a drastic change in the field- angular behavior of J_c is induced: there is not a large enhancement of J_c around B || c, but two large peaks of J_c emerge at the two irradiation angles of θ_i= ±80°. We also demonstrated that the combined configuration consisting of CDs at θ_i = 0°, ±45°, ±60° and ±80° provides a uniform enhancement of J_c over a wide angular-region.

我们在的YBa的宽视场角范围研究磁通钉扎的组合效果由三方向柱状缺陷（CDS）₂的Cu _3层ö _ÿ薄膜，光盘平行于其中Ç -轴和CD在±交叉θ_我（θ_我 = 45°，60°和80°）相对于所述ç轴通过200兆电子伏的Xe离子辐照安装。这三个方向的CD与θ_我≤±60°形成的临界电流密度的场角曲线Ĵ _Ç具有宽峰值为中心在磁场（乙）平行于Ç轴，而Ĵ_Ç显示周围的±交叉角度没有峰θ_我。当交叉角被扩展到θ_我=±80°，在的现场角行为的急剧变化Ĵ _Ç被诱导：没有一个大的增强的Ĵ _Ç周围乙|| Ç，但两个大峰Ĵ _Ç在两个照射角度出现θ_我=±80°。我们还表明，组合的配置自由CdS中的θ_我 = 0°，±45°，±60°和±80°提供的均匀增强Ĵ _Ç在宽角区域。