The fabrication of targets from rare earth elements are extremely difficult due to their highly active reacting properties. Hence, the fabrication, transfer, and storage of these types of targets using in-vacuum transfer facilities is found to be the ideal solution. However, the required instrument for this purpose is very expensive and not easy to maintain for a long period of time. Search for an alternate simplified method and its effective usage for fabrication and preservation of rare earth targets is the need of the hour. The present manuscript describes such a method which has been successfully used in the case of fabricating thin targets from the enriched Neodymium (Nd) isotopes. Since the target materials of enriched Nd-isotopes are expensive, devising a procedure which can produce a maximum number of targets with the use of minimum amount of material is very important. Isotopically enriched thin, uniform and durable Neodymium (${}^{142,150}$Nd) targets of $\sim$ $150\mathrm{\mu }\mathrm{g}$/cm${}^2$ thickness have been fabricated by using electron beam bombardment technique within a diffusion pump based High Vacuum (HV) coating unit. The targets have been fabricated at the target laboratory of the Inter University Accelerator Centre (IUAC), New Delhi. The sandwiched targets have been prepared with a carbon backing layer of thickness $\sim$ $25\mathrm{\mu }\mathrm{g}$/cm${}^2$ and a carbon capping layer of thickness $\sim$ $10\mathrm{\mu }\mathrm{g}$/cm${}^2$. The present article brings out different aspects such as: (i) the detailed fabrication procedure along with the various challenges faced (heat damage, peeling off, oxidizing nature of the target etc.) has been reported in this article; (ii) the measurements involving Energy Dispersive X-ray Spectroscopy (EDS), and Rutherford Backscattering Spectrometry (RBS) have been carried out to assess the purity, uniformity, and elemental composition of the targets. The analysis of the acquired data from the measurements suggests that the prepared targets are found to be free from any high-Z contaminating elements. These targets have successfully been used in heavy-ion induced nuclear physics experiments using the General Purpose Scattering Chamber (GPSC) available at IUAC, New Delhi.

由于稀土元素具有高活性的反应特性，因此极难制造靶子。因此，发现使用真空转移设备制造，转移和存储这些类型的靶标是理想的解决方案。但是，为此目的所需的仪器非常昂贵，并且不易于长时间维护。寻找替代的简化方法及其在制造和保存稀土靶材中的有效用法是一个小时的需求。本手稿描述了这种方法，该方法已成功用于从富集钕（Nd）同位素制备薄靶材的情况。由于富含Nd同位素的目标材料价格昂贵，设计一种使用最少的材料就能产生最大数量目标的方法非常重要。同位素富集的薄而均匀且耐用的钕（${}^{142，150}$Nd）的目标 $〜$ $150\mathrm{\mu }\mathrm{G}$/厘米${}^2$在基于扩散泵的高真空（HV）涂层单元中，通过使用电子束轰击技术制造了厚度最大的涂层。这些靶是在新德里国际大学加速器中心（IUAC）的靶实验室中制造的。夹层靶材已准备好厚度为15mm的碳背衬 $〜$ $25\mathrm{\mu }\mathrm{G}$/厘米${}^2$ 厚度为碳的覆盖层 $〜$ $10\mathrm{\mu }\mathrm{G}$/厘米${}^2$。本文提出了不同的方面，例如：（i）本文已经报道了详细的制造过程以及所面临的各种挑战（热损伤，剥离，靶材的氧化性质等）；（ii）已经进行了涉及能量色散X射线光谱法（EDS）和卢瑟福背散射光谱法（RBS）的测量，以评估目标的纯度，均匀性和元素组成。从测量中获取的数据的分析表明，发现准备好的目标不含任何高Z污染元素。这些目标已通过新德里IUAC的通用散射室（GPSC）成功地用于重离子诱导的核物理实验中。