Abstract

Deposition of chromium nitride (CrN) thin films on Si(100) and low carbon steel (LCS) substrates has been performed using DC magnetron sputtering technique at different values of power from 100 to 150 W. A methodical study of the influence of power on structural and physical properties of the thin films was effected out. Films structure have been investigated by X-ray Diffraction (XRD) and the grain size decreased with increasing the power. Scanning Electron Microscope (SEM) used to define the thickness, where the thickness increased with the increasing of power. The surface morphology was characterized by Atomic Force Microscope (AFM) as well as by optical microscope for CrN thin films. This work shows that the residual stresses of these films, created from process, increased with the increasing of power. The corrosion examinations were presented by potentiodynamic method, Tafel curves, and electrochemical impedance spectroscopy at water solution. The best corrosion resistance characteristics are exhibited by CrN films at 150 W, having the smallest grain size.

中文翻译：

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功率对磁控溅射沉积CrN薄膜的结构，力学性能和腐蚀行为的影响研究

摘要

已经使用直流磁控溅射技术在100至150 W的不同功率值下在Si（100）和低碳钢（LCS）衬底上沉积了氮化铬（CrN）薄膜。功率对功率影响的系统研究实现了薄膜的结构和物理性能。通过X射线衍射（XRD）研究了膜的结构，并且随着功率的增加晶粒尺寸减小。扫描电子显微镜（SEM）用于定义厚度，其中厚度随功率的增加而增加。通过原子力显微镜（AFM）以及光学显微镜对CrN薄膜进行了表征。这项工作表明，这些膜在加工过程中产生的残余应力随着功率的增加而增加。通过电位动力学方法，Tafel曲线和水溶液中的电化学阻抗谱对腐蚀进行了介绍。CrN薄膜在150 W时表现出最佳的耐腐蚀性，晶粒尺寸最小。