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Electrical & Physical Characterization of Silicon-Organic Asymmetrical Metal Insulator Semiconductor Capacitive Test Structure
Silicon ( IF 2.8 ) Pub Date : 2021-01-15 , DOI: 10.1007/s12633-020-00939-8
Rajesh Agarwal

To facilitate the assessment of device characteristics including mobility, threshold voltage, on current estimation, device non-uniformity mapping, etc. without the complete fabrication of transistor structures of different channel lengths or specialized test structures with probes inside/outside the channel, we investigate in this work the impact of electrical and physical parameters on the capacitance-voltage (C − V) characteristics of a fundamental two-terminal, Silicon-Organic Asymmetric Metal-Insulator-Semiconductor (SO-AMIS) capacitive structure. The SO-AMIS test structure is a modified rendition of a regular MIS structure in which the top terminal is made considerably smaller than the bottom gate terminal. The C–V characteristics of this exceptionally asymmetric SO-AMIS structure originate due to the dispersion of the charge carriers into the channel and at any given frequency relies upon channel properties. The impact of contact resistance on measured impedance is least as the effective channel length that contributes to measured capacitance is made substantially large by choosing a small measurement frequency and/or large voltage. Two-dimensional numerical simulations results are performed to outline the effect of critical device parameters on the performance of the pentacene based SO-AMIS test structure. Temperature-dependent investigation is additionally conducted to further elaborate the study of the test structure and its model.



中文翻译:

硅有机不对称金属绝缘子半导体电容测试结构的电气和物理特性

为了便于评估器件特性,包括迁移率,阈值电压,电流估计,器件非均匀性映射等,而无需完整制造不同通道长度的晶体管结构或在通道内/外使用带有探针的专用测试结构,在这项工作中,电气和物理参数对基本的两端硅有机不对称金属绝缘体半导体(SO-AMIS)电容结构的电容-电压(C-V)特性的影响。SO-AMIS测试结构是常规MIS结构的改进形式,其中,顶部端子明显小于底部栅极端子。这种异常不对称的SO-AMIS结构的C–V特性是由于电荷载流子散布到通道中而产生的,并且在任何给定频率下都依赖于通道特性。接触电阻对测量阻抗的影响最小,因为通过选择较小的测量频率和/或较大的电压使有助于测量电容的有效沟道长度变得相当大。进行了二维数值模拟结果,以概述关键器件参数对并五苯基于SO-AMIS测试结构性能的影响。此外,还进行了取决于温度的调查,以进一步完善测试结构及其模型的研究。接触电阻对测量阻抗的影响最小,因为通过选择较小的测量频率和/或较大的电压使有助于测量电容的有效沟道长度变得相当大。进行了二维数值模拟结果,以概述关键器件参数对并五苯基于SO-AMIS测试结构性能的影响。此外,还进行了取决于温度的调查,以进一步完善测试结构及其模型的研究。接触电阻对测量阻抗的影响最小,因为通过选择较小的测量频率和/或较大的电压使有助于测量电容的有效沟道长度变得相当大。进行了二维数值模拟结果,以概述关键器件参数对并五苯基于SO-AMIS测试结构性能的影响。此外,还进行了取决于温度的调查,以进一步完善测试结构及其模型的研究。进行了二维数值模拟结果,以概述关键器件参数对并五苯基于SO-AMIS测试结构性能的影响。此外,还进行了取决于温度的调查,以进一步完善测试结构及其模型的研究。进行了二维数值模拟结果,以概述关键器件参数对并五苯基于SO-AMIS测试结构性能的影响。此外,还进行了取决于温度的调查,以进一步完善测试结构及其模型的研究。

更新日期:2021-01-15
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