The plasma that accelerates and compresses in the formation of the pinch in dense plasma focus devices has been found to be an abundant source of multiple radiations like ion beams and x-rays. In this work, the ion beam and x-ray emissions from a 2.7 kJ (13.5 kV, 30 F) plasma focus device operated at pressure below 1 mbar were investigated. The time profile of the ion beam emission was analysed from the simultaneously measured ion beam, soft and hard x-ray signals using biased ion collectors, BPX 65 silicon PIN diode and a scintillator-photomultiplier tube assembly. Time resolved analysis of the emissions revealed that the emission of the ion beam corresponded to several different pinching instances. Two components of the ion beam were identified. An ion beam of lower energy but higher intensity was emitted followed by an ion beam of higher energy but lower intensity in the first plasma pinch. The ion beam emitted from the first plasma pinch also has higher energy than subsequent plasma pinches. The emission was found to be associated with the amplitude of voltage spike. The results from ion beam and electron beams suggest that they were emitted by the same localized electric field induced in the pinched plasma. The strongest plasma focus discharge indicated by sharp voltage spike of high amplitude and highest ion beam energy were both observed at 0.2 mbar. The average energy of the ion beam obtained is (53 13) keV. At this optimum condition, the ions beam with the highest energy also led to the highest hard x-ray emission.

已经发现，在密集的等离子体聚焦装置中，在收缩的过程中加速和压缩的等离子体是诸如离子束和X射线等多种辐射的丰富来源。在这项工作中，离子束和X射线的发射功率为2.7 kJ（13.5 kV，30F）研究了在低于1mbar的压力下操作的等离子体聚焦装置。使用偏置离子收集器，BPX 65硅PIN二极管和闪烁体-光电倍增管组件，从同时测量的离子束，软和硬X射线信号中分析了离子束发射的时间曲线。对发射的时间分辨分析表明，离子束的发射对应于几种不同的收缩情况。确定了离子束的两个成分。在第一等离子体收缩中，发出能量较低但强度较高的离子束，然后发出能量较高但强度较低的离子束。从第一等离子体收缩发射的离子束还具有比随后的等离子体收缩更高的能量。发现该发射与电压尖峰的幅度有关。离子束和电子束的结果表明，它们是由收缩等离子体中感应的相同局部电场发射的。在0.2 mbar处均观察到最强的等离子体聚焦放电，这是由高振幅的尖锐电压尖峰和最高的离子束能量所表示的。所获得的离子束的平均能量为（53 13）keV。在此最佳条件下，具有最高能量的离子束也导致最高的硬X射线发射。