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Nanostructured copper sulphide films deposited from a precursor bath prepared using RO water
Nano Express ( IF 2.7 ) Pub Date : 2021-01-12 , DOI: 10.1088/2632-959x/abd828
Fasiha Kari 1 , Anjana Kothari 2
Affiliation  

Synthesis of functional nanostructured materials using solution-based low-cost deposition routes is an emerging research area. In this paper, we report deposition of one such material, Copper Sulphide nanostructures (CuS NS), using low-cost chemical bath deposition technique. The films have been deposited on bare glass substrate from a precursor (PS) bath prepared using reverse osmosis (RO) processed water (Drinking water). The deposition of the films has been carried out at three different temperatures, 60, 65 and 70 C. X-ray diffraction study confirmed the CuS NS film possess pure hexagonal covellite phase. Scanning Electron Microscopy of the films revealed the flower-like shape CuS NS are made up of hexagonal plates of side lengths∼38 nm and thickness∼4.76 nm. The average size of the agglomerated grains was calculated 65 nm to 665 nm (60 C), 94 nm to 670 nm (65 C) and 94 nm to 670 nm (70 C) using ImageJ software. The optical study showed the films possess indirect and direct optical energy bandgap (Eg) in the range ∼1.3–1.6 eV and ∼2.4–2.7 eV, respectively.



中文翻译:

从使用反渗透水制备的前体浴中沉积的纳米结构硫化铜膜

使用基于溶液的低成本沉积途径合成功能纳米结构材料是一个新兴的研究领域。在本文中,我们报告了使用低成本化学浴沉积技术沉积的一种此类材料,即硫化铜纳米结构(CuS NS)。薄膜已从使用反渗透(RO)处理水(饮用水)制备的前体(PS)浴中沉积在裸露的玻璃基板上。薄膜的沉积是在60、65和70℃这三种不同的温度下进行的。X射线衍射研究证实CuS NS薄膜具有纯六角六方晶相。膜的扫描电子显微镜显示,花状的CuS NS由边长〜38 nm,厚度〜4.76 nm的六边形板组成。计算出结块晶粒的平均尺寸为65 nm至665 nm(60 C),使用ImageJ软件在94 nm至670 nm(65 C)和94 nm至670 nm(70 C)范围内。光学研究表明薄膜具有间接和直接的光能带隙(Eg)分别在〜1.3–1.6 eV和〜2.4–2.7 eV的范围内。

更新日期:2021-01-12
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