Indium tin oxide (ITO) films were deposited on paper sheets using a low-frequency (60 Hz) DC-pulsed magnetron sputtering (LF-DPMS) with a modified sputtering gun. The deposited ITO films exhibited a cubic structure with a grain size of 20.5 nm. The work function of the films was 4.94 eV, and the surface was highly hydrophobic with a contact angle of 116°. The transmittance at a wavelength of 550 nm was 86.6% and the optical bandgap was 3.33 eV. The resistivity and the sheet resistance were 8.08 × 10⁻³ Ωcm and 40.4 Ω/□. By the end of the deposition process, the fabric structure of the paper sheet remained in good condition, and the as-deposited paper sheet did not bend due to the residual stress of ITO films. From these results, LF-DPMS is considered a damage-free deposition technique, and is rather effective for film depositions on weak substrates including papers, polymers, and fibers.

使用低频（60 Hz）直流脉冲磁控管溅射（LF-DPMS）和改进的溅射枪将氧化铟锡（ITO）膜沉积在纸张上。沉积的ITO膜表现出立方结构，其晶粒尺寸为20.5nm。薄膜的功函为4.94 eV，表面为高度疏水性，接触角为116°。550nm的波长的透射率为86.6％，带隙为3.33eV。电阻率和薄层电阻为8.08×10 ^-3Ωcm和40.4Ω/□。到沉积过程结束时，纸张的织物结构保持良好状态，并且沉积的纸张不会由于ITO膜的残余应力而弯曲。从这些结果来看，LF-DPMS被认为是一种无损伤的沉积技术，对于在包括纸张，聚合物和纤维的薄弱基材上进行薄膜沉积非常有效。