Since its accidental discovery in the mid-1950s, porous silicon has attracted great interest due to its wide range of applications. One of them that has been the subject of recent studies is the use of this material as black silicon, in which with the continuous or gradual variation of the refractive index it is possible to significantly reduce the reflectance of silicon surface. In this work, several samples of this material were produced in order to analyze the feasibility of using porous silicon as a radiation absorber in the visible region. The best results obtained were for samples with six layers with refractive index ranging from 1.4 to 2.4, total thickness of 10,800 nm and reflectance of 5%. The influence of porous layer thickness on the reflectance profile was also observed.

自从1950年代中期意外发现以来，多孔硅由于其广泛的应用而引起了极大的兴趣。最近研究的主题之一是将该材料用作黑硅，其中随着折射率的连续或逐渐变化，可以显着降低硅表面的反射率。在这项工作中，生产了这种材料的几个样品，以分析在可见光区域使用多孔硅作为辐射吸收剂的可行性。对于具有六层折射率介于1.4到2.4之间，总厚度为10,800 nm和反射率为5％的样品，获得的最佳结果。还观察到多孔层厚度对反射率分布的影响。