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Realization of Wafer‐Scale 1T‐MoS2 Film for Efficient Hydrogen Evolution Reaction
ChemSusChem ( IF 7.5 ) Pub Date : 2021-01-05 , DOI: 10.1002/cssc.202002578
Hyeong‐U. Kim 1 , Mansu Kim 2 , Hyunho Seok 3 , Kyu‐Young Park 4 , Ji‐Yun Moon 5 , Jonghwan Park 2 , Byeong‐Seon An 6 , Hee Joon Jung 4, 7 , Vinayak P. Dravid 4, 7 , Dongmok Whang 2, 3 , Jae‐Hyun Lee 5 , Taesung Kim 3, 8
Affiliation  

The octahedral structure of 2D molybdenum disulfide (1T‐MoS2) has attracted attention as a high‐efficiency and low‐cost electrocatalyst for hydrogen production. However, the large‐scale synthesis of 1T‐MoS2 films has not been realized because of higher formation energy compared to that of the trigonal prismatic phase (2H)‐MoS2. In this study, a uniform wafer‐scale synthesis of the metastable 1T‐MoS2 film is performed by sulfidation of the Mo metal layer using a plasma‐enhanced chemical vapor deposition (PE‐CVD) system. Thus, plasma‐containing highly reactive ions and radicals of the sulfurization precursor enable the synthesis of 1T‐MoS2 at 150 °C. Electrochemical analysis of 1T‐MoS2 shows enhanced catalytic activity for the hydrogen evolution reaction (HER) compared to that of previously reported MoS2 electrocatalysts 1T‐MoS2 does not transform into stable 2H‐MoS2 even after 1000 cycles of HER. The proposed low‐temperature synthesis approach may offer a promising solution for the facile production of various metastable‐phase 2D materials.

中文翻译:

Wafer-Scale 1T-MoS2薄膜实现高效析氢反应的实现

二维二硫化钼(1T-MoS 2)的八面体结构作为一种高效,低成本的制氢电催化剂备受关注。但是,由于与三棱柱相(2H)-MoS 2相比具有更高的形成能,因此尚未实现1T-MoS 2膜的大规模合成。在这项研究中,通过使用等离子增强化学气相沉积(PE-CVD)系统硫化钼金属层,对亚稳1T-MoS 2薄膜进行了均匀的晶圆级合成。因此,含等离子体的高反应性离子和硫化前体的自由基能够在150°C的温度下合成1T-MoS 2。1T-MoS 2的电化学分析示出了增强的相比于先前报道的MoS的析氢反应(HER)的催化活性2个电催化剂1T-MOS 2不变换成稳定的2H-MOS 2即使在HER的1000个循环。拟议的低温合成方法可能为各种亚稳态2D材料的简便生产提供有希望的解决方案。
更新日期:2021-03-07
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