In this investigation ZnFe₂O₄ thin films were fabricated by RF magnetron sputtering and the magnetic behavior was examined under the influence of the growth conditions in three types of atmospheres, using near-ambient pressure X-ray photoelectron spectroscopy (NAP-XPS) and vibrating sample magnetometry (VSM). XPS revealed that films under an Ar/O₂ ratio 1:2 and 2:1 have Fe/Zn atomic ratios similar to the Fe/Zn stoichiometric composition; while the films deposited in pure Ar atmosphere, showed a formation of Fe ions (Fe⁰) reduced by Ar ion sputtering. VSM revealed an enhancing of the saturation magnetization for the ZFO in thin films unlike the samples in bulk, suggesting that Fe ions migrate to A sites and the interaction J_AB dominates the magnetic properties instead of J_BB interaction.

在这项研究中，ZnRF ₂ O ₄薄膜是通过RF磁控溅射制备的，并在接近环境压力X射线光电子能谱（NAP-XPS）的条件下，在三种类型的气氛中，在生长条件的影响下研究了磁性。振动样品磁力计（VSM）。XPS显示，在Ar / O ₂比为1：2和2：1的情况下，薄膜的Fe / Zn原子比与Fe / Zn化学计量组成相似。而在纯Ar气氛中沉积的薄膜则显示出通过Ar离子溅射还原形成的Fe离子（Fe ⁰）。VSM揭示了薄膜中ZFO的饱和磁化强度有所增强，这与散装样品不同，这表明Fe离子迁移至A位点，并且相互作用J_AB决定了磁性，而不是J _BB相互作用。