The sputtering yield of tungsten pellets composed of different particle sizes of <1, 12, 44–74, and 149–297 μm was systematically investigated by bombardment with Ar⁺ ions accelerated at 2.0 keV in an ultra-high vacuum chamber. We found that the tungsten sample fabricated from larger particles had a higher surface roughness, based on the surface profile results. Using the data of the surface roughness for the four types of tungsten pellets, we confirmed that the sputtering yield for a tungsten pellet with the highest surface roughness was 7 times lower than that of the lowest surface roughness. This could be due to the redeposition of sputtered tungsten particles onto neighboring asperities.

通过在超高真空室内用加速至2.0 keV的Ar ⁺离子轰击，系统地研究了由<1、12、44-74和149-297μm的不同粒径组成的钨颗粒的溅射产率。根据表面轮廓结果，我们发现由较大颗粒制成的钨样品具有较高的表面粗糙度。使用四种钨粒的表面粗糙度数据，我们确认到，具有最高表面粗糙度的钨粒的溅射产率比最低表面粗糙度的溅射产率低7倍。这可能是由于溅射的钨粒子重新沉积到相邻的凹凸上。