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Analog and RF Performance Evaluation of Junctionless Accumulation Mode (JAM) Gate Stack Gate All Around (GS-GAA) FinFET
Silicon ( IF 2.8 ) Pub Date : 2021-01-03 , DOI: 10.1007/s12633-020-00910-7
Bhavya Kumar , Rishu Chaujar

This work presents the analog and RF performance evaluation of Junctionless Accumulation Mode (JAM) Gate Stack Gate All Around (GS-GAA) FinFET, and the results acquired have been compared with conventional FinFET and GAA FinFET. It has been observed that in comparison to conventional FinFET, leakage current (Ioff) reduces by almost thirty times for the GS-GAA FinFET configuration. Thus, revamping the threshold voltage (Vth), switching ratio (Ion/Ioff), and subthreshold slope (SS) of the proposed device. Also, major analog parameters like transconductance (gm), transconductance generation factor (TGF) enhances considerably with early voltage (VEA) and intrinsic gain (Av) increased by over two times in magnitude for the GS-GAA FinFET configuration. Furthermore, several important RF parameters have been explored, and the outcome of the study is that the GS-GAA FinFET configuration shows superior RF performance. In GS-GAA FinFET configuration, the gain frequency product (GFP) and gain transconductance frequency product (GTFP) amplified by over two times in magnitude with minimal decrease in the cut-off frequency (fT) and maximum oscillation frequency (fmax). Thus, the proposed GS-GAA FinFET device can be looked upon as an appealing option for high-frequency analog/RF applications.



中文翻译:

无结累积模式(JAM)栅堆叠栅全能(GS-GAA)FinFET的模拟和RF性能评估

这项工作提出了无结累积模式(JAM)栅堆叠栅全能(GS-GAA)FinFET的模拟和RF性能评估,并将获得的结果与常规FinFET和GAA FinFET进行了比较。已经观察到,与常规FinFET相比,GS-GAA FinFET配置的泄漏电流(I off)降低了近30倍。因此,修改了所提出装置的阈值电压(V th),开关比(I on / I off)和亚阈值斜率(SS)。此外,主要的模拟参数,如跨导(g m),跨导生成因子(TGF)随早期电压(V EA)和固有增益(A v对于GS-GAA FinFET配置,其幅度增加了两倍以上。此外,已经探索了几个重要的RF参数,并且研究结果是GS-GAA FinFET配置显示了出色的RF性能。在GS-GAA FinFET配置中,增益频率乘积(GFP)和增益跨导频率乘积(GTFP)的幅度放大了两倍以上,同时截止频率(f T)和最大振荡频率(f max)的减小最小。因此,可以将提出的GS-GAA FinFET器件视为高频模拟/ RF应用的理想选择。

更新日期:2021-01-03
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