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Influence of sputtered time on the structural and optical characterization of Al-doped ZnO thin films prepared by RF sputtering technique
Optical and Quantum Electronics ( IF 3.3 ) Pub Date : 2021-01-01 , DOI: 10.1007/s11082-020-02687-w
Nader Ghobadi , Mahdiyeh Shiravand , Ebrahim Gholami Hatam

In this project, aluminum doped zinc oxide thin films were deposited on glass substrate by the RF sputtering technique. The consequence of sputtered time on the structural and optical characteristics was evaluated. The optical parameter values were determined by ultra violet visible spectroscopy that the nature of optical transitions reveals direct allowed transition for all AZO thin films. Also, some physical quantities such as the Urbach tail energy, refractive index (n) in the edge of absorption and dielectric constant (ε) were reported for the AZO thin films with various sputtered time. Derivation ineffective thickness method (DITM) was employed to the optical band gap determination and transition index without any presumption about transition natural. Time of reaction plays an essential role in controlling the physical quantities of thin films. This parameter helps to obtain the optimal thickness.

中文翻译:

溅射时间对射频溅射法制备的Al掺杂ZnO薄膜结构和光学特性的影响

在该项目中,铝掺杂氧化锌薄膜通过射频溅射技术沉积在玻璃基板上。评估了溅射时间对结构和光学特性的影响。光学参数值由紫外可见光谱确定,光学跃迁的性质揭示了所有 AZO 薄膜的直接允许跃迁。此外,还报告了具有不同溅射时间的 AZO 薄膜的一些物理量,例如 Urbach 尾能、吸收边缘的折射率 (n) 和介电常数 (ε)。推导无效厚度法(DITM)用于光学带隙测定和跃迁指数,没有任何关于自然跃迁的假设。反应时间在控制薄膜的物理量方面起着至关重要的作用。该参数有助于获得最佳厚度。
更新日期:2021-01-01
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