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The effect of sub-second intervals of ArF laser irradiation on the formation of periodic micro-swelling structures on silicone rubber surfaces
Aip Advances ( IF 1.4 ) Pub Date : 2020-12-15 , DOI: 10.1063/5.0031927
Tsuyoshi Yoshida 1 , Masayuki Okoshi 1
Affiliation  

Surface modification and microstructure formation of silicone rubber are gathering attention as popular methods of wettability control for microfluidic devices and biomedical applications. In this report, micro-swelling structures were fabricated on silicone rubber surfaces by ArF laser irradiation at various pulse repetition rates. The average height of the swelling structures shows a negative correlation with the pulse repetition rates of 2 Hz–20 Hz. The relationship between the microstructure height and the number of ArF laser shots was investigated at 2 Hz, 6 Hz, and 20 Hz pulse repetition rates, and it is presented that the growth of microstructures saturates with the smaller number of shots at the higher pulse repetition rate. These results imply the possibility of other competing mechanisms that disturb the swelling of silicone rubber by the ArF laser irradiation. The Attenuated Total reflection Fourier Transform Infrared spectroscopy measurement of the silicone rubber surface shows that the desorption of the –CH3 group proceeds more efficiently at the higher pulse repetition rate. It is concluded that the modification of silicone to the silica-like structure that increases in surface hardness disturbs the growth of the swelling structure, and the sub-second intervals of the ArF laser pulse suppress the modification of silicone to the silica-like structure. The understanding of the processes after photodissociation contributes not only to the effective formation of microstructures but also to the chemical modification of the silicone rubber surface.

中文翻译:

亚秒间隔的ArF激光辐照对硅橡胶表面周期性微溶结构形成的影响

作为用于微流体装置和生物医学应用的可湿性控制的流行方法,硅橡胶的表面改性和微结构形成引起了人们的关注。在本报告中,通过ArF激光辐射以各种脉冲重复速率在硅橡胶表面上制造了微膨胀结构。肿胀结构的平均高度与2 Hz–20 Hz的脉冲重复率呈负相关。研究了在2 Hz,6 Hz和20 Hz脉冲重复频率下显微结构高度与ArF激光发射次数之间的关系,结果表明,随着脉冲重复次数的增加,显微结构的增长会随着较少的发射次数而饱和率。这些结果暗示了其他竞争机制可能会干扰ArF激光辐照使硅橡胶膨胀。硅橡胶表面的衰减全反射傅立叶变换红外光谱测量表明–CH的解吸第三组以较高的脉冲重复率更有效地进行。可以得出结论,将有机硅改性为表面硬度增加的二氧化硅样结构会干扰溶胀结构的生长,并且ArF激光脉冲的亚秒间隔会抑制有机硅改性为二氧化硅样结构。对光离解后的过程的理解不仅有助于有效地形成微观结构,而且有助于硅橡胶表面的化学改性。
更新日期:2020-12-31
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