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Structural Properties of Fe 3 Si thin Films at Different Pulsed-Laser-Deposition Modes
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques ( IF 0.5 ) Pub Date : 2020-12-28 , DOI: 10.1134/s1027451020060270
N. G. Barkovskaya , A. I. Grunin , E. S. Clementyev , A. Yu. Goikhman

The formation and investigation of Fe3Si thin films by pulsed laser deposition is reported. The structural properties depending on the formation parameters are investigated. Three different approaches to the synthesis of iron-silicide thin films by pulsed laser deposition are explored: deposition from a stoichiometric alloy target, the simultaneous co-deposition of pure Fe and Si targets by two lasers and the single-laser cyclic co-deposition of pure targets.



中文翻译:

Fe 3 Si薄膜在不同脉冲激光沉积模式下的结构性质

报道了通过脉冲激光沉积形成和研究Fe 3 Si薄膜的方法。研究了取决于地层参数的结构特性。探索了三种不同的通过脉冲激光沉积法合成硅化铁薄膜的方法:从化学计量合金靶进行沉积,通过两个激光同时共沉积纯铁和硅靶以及单激光循环共沉积。纯目标。

更新日期:2020-12-28
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