Abstract

Using a set of physicochemical (ellipsometry and contact angle measurements), electrochemical (electrochemical impedance spectroscopy and polarization measurements), and corrosion (periodic moisture condensation and salt fog tests) methods, the properties of adsorption films formed on copper by the chamber method from vapors of benzotriazol (BTA), 1H-1,2,4-triazole, tolyltriazole (TTA), 5-chloro-1,2,3-benzotriazole (CBTA), 3-amino-1H-1,2,4-triazole, and 4-amino-1H-1,2,4-triazole at a temperature of 100°C are studied. It is shown that 1-h chamber treatment of copper with vapors of these compounds leads to the formation of nanoscale hydrophobic adsorption films on it, which inhibits the thermal growth of oxides, but stabilizes the passive state of the metal and increases its corrosion resistance. Among these different triazole compounds tested as chamber corrosion inhibitors, BTA and its substituted derivatives are distinguished. After a 1-h chamber treatment of copper, the protective aftereffect of the adsorption films of triazole derivatives grows symbatically with their saturated vapor pressure at the chamber treatment temperature, i.e., in the following increasing order: CBTA < TTA < BTA. This may indicate that the equilibrium adsorption films do not have time to form at 100°С on the metal within this time period. After a prolonged (24 h or more) chamber treatment of copper with vapors of substituted benzotriazoles, equilibrium adsorption films of inhibitors are formed on it. In this case, the influence of the chamber inhibitor properties on their protective aftereffect alternates. Under such conditions, the least volatile and most hydrophobic substituted benzotriazole, i.e., CBTA, provide the best metal protection.

中文翻译：

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三唑类化合物对腔室的铜的大气腐蚀保护

摘要

通过使用一组物理化学方法（椭圆光度法和接触角测量法），电化学方法（电化学阻抗谱法和极化度测量法）和腐蚀方法（周期性水分凝结和盐雾试验）方法，通过室法在铜上由蒸气形成的吸附膜的特性苯并三唑（BTA），1H-1,2,4-三唑，甲苯基三唑（TTA），5-氯-1,2,3-苯并三唑（CBTA），3-氨基-1H-1,1,2,4-三唑研究了在100℃下的4-氨基-1H-1,2,4-三唑。结果表明，用这些化合物的蒸气对铜进行1小时的腔室处理会导致在其上形成纳米级疏水吸附膜，从而抑制了氧化物的热生长，但稳定了金属的钝态并提高了其耐腐蚀性。在作为腔室腐蚀抑制剂测试的这些不同的三唑化合物中，BTA及其取代的衍生物与众不同。在对铜进行1小时的腔室处理后，在腔室处理温度下，三唑衍生物的吸附膜的保护后效应与其饱和蒸气压成比例增长，即以以下递增顺序：CBTA <TTA <BTA。这可能表明在该时间段内，平衡吸附膜没有时间在100°C的金属上形成。用取代的苯并三唑蒸气长时间（24小时或更长时间）对铜进行室处理后，在其上形成了平衡的抑制剂吸附膜。在这种情况下，腔室抑制剂性能对其保护性后效应的影响交替出现。在这种情况下