The optical density and topography characterizations of MWCNTs on Ni-Cu/ a-C:H substrates with different copper percentage,Microscopy Research and Technique

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The optical density and topography characterizations of MWCNTs on Ni-Cu/ a-C:H substrates with different copper percentage
Microscopy Research and Technique ( IF 2.0 ) Pub Date : 2020-12-22 , DOI: 10.1002/jemt.23679
Vali Dalouji ₁ , Samira Goudarzi ₁ , Shahram Solaymani ₂

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In this article, the Ni-Cu nanoparticles (NPs) in the amorphous carbon hydrogenated thin films with different copper percentage by co-deposition of RF-plasma enhanced chemical vapor deposition were prepared using acetylene gas and Ni and Cu targets. The films deposited with 5% Cu have minimum value of the average diameter of Multi-walled Carbon Nanotubes, MWCNTs, in about of 100 nm. It can be seen that the lateral size values of the nanoparticles for films with 5% Cu have minimum value of 5.34 nm. Films deposited with 75% Cu have maximum value of optical density specially in high energy. The spectral density power of all films indicated the presence of fractal components in prominent topographies. Films deposited without Cu NPs have minimum value of fractal dimension in about of 2.96. The diagram of the bearing area versus the nanoparticles height has shown the percentage of cavities and single-layers. The single-layer contents of all films were about 95%.

中文翻译：

不同铜含量的Ni-Cu / aC：H衬底上MWCNT的光密度和形貌表征

在本文中，通过乙炔气体和Ni和Cu靶标，通过共沉积RF-等离子体增强化学气相沉积，制备了具有不同铜百分比的非晶碳氢化薄膜中的Ni-Cu纳米颗粒（NPs）。沉积有5％Cu的薄膜的多壁碳纳米管MWCNT的平均直径的最小值约为100 nm。可以看出，具有5％Cu的膜的纳米颗粒的横向尺寸值具有5.34nm的最小值。沉积有75％Cu的薄膜在高能量下具有最大的光密度值。所有薄膜的光谱密度强度表明在显着的形貌中存在分形成分。没有Cu NP沉积的膜的分形维数最小值约为2.96。承载面积与纳米颗粒高度的关系图显示了空腔和单层的百分比。所有膜的单层含量为约95％。

更新日期：2020-12-22

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