Abstract Positive-tone photosensitive polybenzoxazoles (PSPBOs) based on poly(o-hydroxyamide) (PHA) precursors were synthesized from a reaction of 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane (Bis-AP-AF), 4,4’-oxybisbenzoyl chloride (OBC), and maleic anhydride as an end-capper to control the degree of polymerization. The prepared photoresists were composed of the synthesized PHA precursors and diazonaphthoquinone (DNQ) photo-sensitizer. The photolithographic properties of the PSPBO according to the end-capper contents were investigated. Clear positive-tone images were obtained on the PHA precursor films, which had been irradiated with 450 mJ/cm2 of the i-line and developed using a 2.38 wt. % tetramethylammonium hydroxide (2.38% TMAH) solution. The PHA precursor fully converted to a PBO pattern by heating to 350 °C for 1 h under a nitrogen atmosphere.

中文翻译：

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正性光可图案化聚苯并恶唑的合成与表征：马来酸酐封端剂含量的影响

摘要 2,2-双（3-氨基-4-羟基苯基）六氟丙烷（Bis-AP-AF）反应合成了基于聚（邻羟基酰胺）（PHA）前驱体的正色调光敏聚苯并恶唑（PSPBOs）， 4,4'-氧双苯甲酰氯 (OBC) 和马来酸酐作为封端剂来控制聚合度。制备的光刻胶由合成的 PHA 前体和重氮萘醌 (DNQ) 光敏剂组成。研究了根据封端剂含量的 PSPBO 的光刻性能。在 PHA 前体薄膜上获得了清晰的正色调图像，该薄膜已用 450 mJ/cm2 的 i-line 进行辐照并使用 2.38 wt. %四甲基氢氧化铵（2.38% TMAH）溶液。