The evaporation of fluid on solid surface is an important process in nature and industry. The high-efficiency heat transport between the working fluid and the solid surface can enhance the energy conversion and utilization. Thus, it is of great significance to study the mechanism of the evaporation phenomenon at the liquid–solid interface. In this study, the evaporation of refrigerant R32 on Pt surface is investigated by molecular dynamics (MD) method. The effects of the substrate temperature on the evaporation behavior of R32 are discussed in detail. It is found that R32 molecules mainly enter the vapor region by evaporation when the substrate temperature is no larger than 300 K. The evaporation rate increases with the increase of substrate temperature. The nucleate boiling and film boiling clearly occur when the substrate temperature is 350 K. The nanobubble formation, growth and coalesce is observed in the simulation. The heat flux changes rapidly when the system is boiling. As time goes on, a vapor film forms and then it leads to the heat transfer deterioration.

固体表面上的流体蒸发是自然界和工业界的重要过程。在工作流体和固体表面之间的高效热传递可以提高能量转换和利用。因此，研究液固界面蒸发现象的机理具有重要意义。在这项研究中，通过分子动力学（MD）方法研究了制冷剂R32在Pt表面的蒸发。详细讨论了基板温度对R32蒸发行为的影响。发现当基体温度不大于300 K时，R32分子主要通过蒸发进入蒸气区域。蒸发速率随基体温度的升高而增加。当基板温度为350 K时，明显发生核沸腾和膜沸腾。在模拟中观察到纳米气泡的形成，生长和聚结。当系统沸腾时，热通量迅速变化。随着时间的流逝，会形成蒸汽膜，然后导致热传递恶化。