In this paper, vanadium nitride (VN) thin films have been deposited on Al substrates by reactive magnetron sputtering. Thermochromic VO₂ films have been obtained by air oxidation of VN samples performed at three temperatures (450, 525 and 550 °C) at various durations (lower than 50 min). X-ray diffraction and Raman spectrometry of the VN oxidized films indicate that VO₂ and V₂O₅ are the only phases produced during the oxidation process. Vanadium dioxide is the first oxide formed. It coexists with VN in a long period at 450 °C or suddenly disappears at 525 and 550 °C. Whatever the temperature, V₂O₅ is exclusively detected after the total oxidation of VN. This oxide is detrimental to the thermochromic performance of films. The emissivity-switching properties of the oxidized films were analyzed by infrared camera in the 7.5–13 μm range. The comparison among all the samples exhibiting a thermochromic behavior shows that the maximum emissivity switch is independent of the oxidation temperature and the surface morphology of the samples. These results could open a new strategy in the investigation of VN oxidation as a method to obtain VO₂, along with an insight into the correlation between surface morphology and optical properties.

在本文中，已经通过反应磁控溅射将氮化钒（VN）薄膜沉积在Al基板上。通过在三个温度（450、525和550°C）下以不同的持续时间（低于50分钟）对VN样品进行空气氧化，可获得热致变色VO ₂膜。VN氧化膜的X射线衍射和拉曼光谱表明，VO ₂和V ₂ O ₅是氧化过程中产生的唯一相。二氧化钒是形成的第一氧化物。它在450°C下与VN长期共存，或者在525和550°C下突然消失。无论温度如何，V ₂ O ₅仅在VN完全氧化后才能检测到。该氧化物对膜的热致变色性能有害。用红外热像仪在7.5-13μm范围内分析了氧化膜的发射率转换特性。所有表现出热致变色行为的样品之间的比较表明，最大发射率转换与样品的氧化温度和表面形态无关。这些结果可以为研究VN氧化作为一种​​获得VO ₂的方法开辟新的策略，并深入了解表面形态与光学性质之间的相关性。