Abstract

The processes of structure formation in arc-PVD Ti–Cr–N coatings are studied by computer simulation methods. A new approach to defining the geometric space for determining the positions of atoms relative to the formed dimers and crystallites is proposed. The structure parameters are calculated, and the processes of structure formation in coatings at a potential of 120 V are studied.

中文翻译：

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动力学蒙特卡洛法研究陶瓷涂层结构形成过程

摘要

通过计算机模拟方法研究了电弧PVD Ti–Cr–N涂层中结构的形成过程。提出了一种定义几何空间的新方法，该几何空间用于确定原子相对于形成的二聚体和微晶的位置。计算了结构参数，并研究了在120 V电势下涂层中的结构形成过程。