The studies on tungsten (W) sputtering and transport characteristics on EAST tokamak under resonant magnetic perturbation (RMP) fields have been performed with the three-dimensional edge transport code EMC3-EIRENE. The estimation of the W sputtering flux has been carried out based on EMC3-EIRENE modeling for RMP and no RMP applications. The W sputtering flux shows a small difference between RMP and no RMP cases due to weak sensitivity of W sputtering yield on deuterium impact energy for low edge plasma density. However, for high edge plasma density, the strong dependence of W sputtering yield on deuterium impact energy comes into play, which results in a remarkable difference in the W sputtering flux between RMP and no RMP cases. Impacts of the W impurity perpendicular transport on W ions transport have been investigated. With low W perpendicular transport coefficient for RMP case, the edge plasma has a better W ions screening effect for high edge plasma density. The increased W perpendicular transport coefficient results in a good W ions screening effect for both high and low edge plasma densities.

利用三维边缘传输代码EMC3-EIRENE，对在共振磁扰动（RMP）场下EAST托卡马克上的钨（W）溅射和传输特性进行了研究。W溅射通量的估计是基于RMP和无RMP应用的EMC3-EIRENE模型进行的。由于低边缘等离子体密度的W溅射产率对氘冲击能的敏感性较弱，因此W溅射通量在RMP情况与没有RMP情况之间显示出很小的差异。然而，对于高边缘等离子体密度，W溅射产率对氘冲击能的强烈依赖性开始发挥作用，这导致RMP案例和无RMP案例之间的W溅射通量有显着差异。研究了W杂质垂直传输对W离子传输的影响。对于RMP情况，由于W垂直传输系数低，边缘等离子体具有较高的W离子屏蔽效果，可实现较高的边缘等离子体密度。W垂直传输系数的增加对于高边沿等离子体密度和低边沿等离子体密度都具有良好的W离子屏蔽效果。