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INFLUENCE OF THE SUBSTRATE TEMPERATURE ON TiO2 THIN LAYERS DEPOSITED BY THE DIRECT CURRENT MAGNETRON SPUTTERING TECHNOLOGY
Surface Review and Letters ( IF 1.1 ) Pub Date : 2020-11-04 , DOI: 10.1142/s0218625x20500547
RADOUANE GRAINE 1 , KHOULOUD BEDOUD 1 , NADJETTE SEHAB 1 , DJAMEL ZELMATI 1
Affiliation  

In this study, Anatase thin films of titanium dioxide (TiO[Formula: see text] are deposited by the Direct Current (DC) magnetron sputtering technique on glass substrate for future application in gas sensors. In our work, we focused and discussed the effect of various substrate temperatures [Formula: see text]C, [Formula: see text]C and [Formula: see text]C, and film thicknesses 142, 220 and 410[Formula: see text]nm, respectively, in order to study the structural and optical properties of the TiO2 thin films. The crystalline structure and optical properties of TiO2 nanoparticles were investigated using X-ray Diffraction (XRD), Scanning Electron Microscopy (SEM), Energy-Dispersive X-ray Spectroscopy (EDS), Atomic Force Microscopy (AFM), Raman spectroscopy and UV–visible spectroscopy. The formation of the Anatase TiO2 with Tetragonal crystal structure has been confirmed with XRD. UV–visible spectrophotometry characterization of the developed thin films showed that all the films had an optical transmission greater than 92% in the visible region. In addition, the obtained direct and indirect optical band gaps using the Tauc plot are 3.66, 3.34[Formula: see text]eV at [Formula: see text]C 3.74, 3.37[Formula: see text]eV at [Formula: see text]C and 3.71, 3.37[Formula: see text]eV at [Formula: see text]C, respectively. Forouhi–Bloomer (FB) physical model has been used to obtain the refractive index and extinction coefficient by fitting theoretical transmittance curves to experimental ones. The optical refractive index is found to vary from 2.350 for [Formula: see text]C, 2.1499 for [Formula: see text]C and 2.1420 for [Formula: see text]C. Moreover, we have obtained an extinction coefficient [Formula: see text] ([Formula: see text] of around [Formula: see text] for both substrate temperatures [Formula: see text]C and [Formula: see text]C, and around [Formula: see text] for the [Formula: see text]C.

中文翻译:

基板温度对直流磁控溅射技术沉积TiO2薄膜的影响

在这项研究中,锐钛矿薄膜二氧化钛(TiO[分子式:见正文]通过直流(DC)磁控溅射技术沉积在玻璃基板上,用于未来在气体传感器中的应用。在我们的工作中,我们重点讨论了效果[公式:见正文]C、[公式:见正文]C和[公式:见正文]C,薄膜厚度分别为142、220和410[公式:见正文]nm,以研究TiO的结构和光学性质2薄膜。TiO的晶体结构和光学性质2使用 X 射线衍射 (XRD)、扫描电子显微镜 (SEM)、能量色散 X 射线光谱 (EDS)、原子力显微镜 (AFM)、拉曼光谱和紫外-可见光谱研究纳米颗粒。锐钛矿型二氧化钛的形成2XRD证实具有四方晶体结构。所开发薄膜的紫外-可见分光光度法表征表明,所有薄膜在可见光区域的透光率均大于 92%。此外,使用 Tauc 图获得的直接和间接光学带隙分别为 3.66、3.34[公式:参见文本]eV 在 [公式:参见文本]C 3.74、3.37[公式:参见文本]eV 在 [公式:参见文本] ]C 和 3.71、3.37[公式:见文本]eV 分别位于 [公式:见文本]C。Forouhi-Bloomer (FB) 物理模型已用于通过将理论透射率曲线拟合到实验曲线来获得折射率和消光系数。发现光学折射率从[公式:参见文本]C的2.350、[公式:参见文本]C的2.1499和[公式:参见文本]C的2.1420变化。而且,
更新日期:2020-11-04
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